Summary
This module will elucidate the fundamental processes of film nucleation and growth and how they can be manipulated by low-energy metal and gas ion fluxes to achieve high-quality films at low deposition temperatures.
Topics
- Film growth processes-nucleation, coalescence, competitive grain growth, recrystallization
- Zone diagrams
- Effects of sputtered atoms energy
- Effects of reactive species
- Texture inheritance
- Metal-ion etch and adhesion control
- Kinetic roughing and surface facet formation
- Use of low-energy ion bombardment to control microstructure during low-temperature film growth
- Effects of gas ion energy
- Use of high fluxes of low-energy gas ions; low-temperature sputter epitaxy
- HIPIMS – source of energetic metal ions
- Use of synchronized bias in HIPIMS
- Hybrid HIPIMS/DCMS co-sputtering
- Light metal ions; supersaturated metastable TM nitrides
- Heavy metal ions; low-temperature, dense, stress-free hard coatings
Instructor
Ivan Petrov
PhD, D.h.c., Professor
Materials Research Laboratory, Univ. of Illinois at Urbana-Champaign, USA
Department of Physics, Linköping University, Sweden
