Technical Symposium CM
This Symposium focuses on recent advances in microstructural, chemical, electrical, optical, and mechanical characterization of coatings and thin films, as well as advanced modelling and computation techniques, which enhance our understanding of the fundamental structure-property-processing relationships. In addition, the symposium will cover topics related to high-throughput thin film development, including combinatorial synthesis, automated characterization, and data science approaches such as machine learning or artificial intelligence for large data processing. Of interest are contributions that either highlight the application of recent advances in analytical methods, characterization techniques, and nano-mechanical testing methods for coating evaluation, or present advanced and innovative modelling techniques to understand coating properties.
CM1: Spatially-resolved and in situ Characterization of Thin Films, Coatings and Engineered Surfaces
This session deals with novel spatially-resolved structural/chemical and microstructural characterization techniques, especially those that advance the in-depth understanding of the relationship between processing, structure, and properties of thin films and engineered surfaces. Particular attention will be given to cutting-edge experiments providing in situ information on structure or microstructural evolution during growth or during post-growth stimuli (mechanical, thermal, …). Especially, the session will focus on the emerging area of three-dimensional microstructural characterization in small volumes, such as atom probe tomography, TEM characterization, FIB/SEM/EBSD tomography, and ToF-SIMS 3D mapping, dynamic characterization of thin film growth, ellipsometry, wide- and small-angle X-ray/neutron scattering, reflectometry, micro-Raman spectroscopy, etc.
CM1 Invited Speakers:
- Nicolas Bonmassar, University of Stuttgart, Germany
- Stephan Gerstl, ETH Zurich, Switzerland
- Yujiao Li, Ruhr University Bochum, Germany, “Accelerated Atomic-Scale Exploration of Phase Evolution in High-Entropy Alloys Using Combinatorial Processing Platforms (CPP)”
- Michael Meindlhumer, Erich Schmid Institute of Materials Science, Austria, “In Situ Micromechanical Characterization of Nanocrystalline Materials Coupled with X-Ray Nanodiffraction”
CM2: Advanced Mechanical Testing of Surfaces, Thin Films, Coatings, and Small Volumes
This session focuses on cutting-edge mechanical and multi-physical characterization techniques for surfaces, thin films, coatings, and small-volume materials. Emphasis is placed on the development and application of novel methods that probe mechanical and electrical, thermal, magnetic, and interfacial properties, and/or exploring the interconnection with the mechanical behavior. Contributions that introduce innovative nanoindentation and micro- and nano-mechanical approaches and advanced physical characterization—particularly on coatings, thin films, and near-surface regions, including those prepared by focused ion beam (FIB) or other lithographic techniques—are highly encouraged. Studies that investigate relationships between microstructure and properties are particularly relevant. Multi-technique mechanical/physical testing—such as in situ experiments within SEM, TEM, Raman, and X-ray beamlines—are also welcome. Moreover, we especially invite papers that explore characterization under non-ambient and extreme conditions, including high and cryogenic temperatures, radiation exposure, hydrogen environments, cyclic loading, and high strain rates. Understanding the effects of these conditions on deformation mechanisms, mechanical/physical properties, and their coupling in coatings and thin films is of significant interest.
CM2 Invited Speakers:
- Xufei Fang, Karlsruhe Institute of Technology, Germany, “Functional Dislocations in Oxides: Near-Surface Engineering and Extension to Thin Films”
- Jean Charles Stinville, University of Illinois at Urbana-Champaign, USA
- Christophe Tromas, University of Poitiers, France
CM3: Data-Driven Thin Film Design: High-Throughput Experimentation, Simulation, and Machine Learning
This session covers all topics related to accelerated, high-throughput thin films and coatings development. This includes studies on rapid thin film materials development and coatings optimization, but also recent advances and developments in high-throughput research methods. Of particular interest are advanced approaches for synthesis, such as combinatorial or autonomous thin film deposition, but also automated characterization techniques. An emphasis is put on the role of data, the efficient handling of large data sets, as well as the application of data science techniques and machine learning to high-throughput experimental workflows. This session complements CM4, which focuses on advanced theoretical approaches for materials discovery and design.
CM3 Invited Speakers:
- Mahshid Ahmadi, University of Tennessee, USA
- Andrea Crovetto, DTU, Denmark
- Davi Febba, NREL, USA
- Andrea Giunto, UC Berkeley, USA, “High-throughput Synthesis and Characterization of Powder Materials”
- Yongtao Liu, Oak Ridge National Laboratory, USA
- Vladan Stevanovic, Colorado School of Mines, USA
- Ichiro Takeuchi, University of Maryland, USA